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Lint Free Anti Static Cleanroom Wipes For Semiconductors Silicon Wafer

Lint Free Anti Static Cleanroom Wipes For Semiconductors Silicon Wafer

  • Highlight

    Anti-Static Cleanroom Wipes

    ,

    Semiconductors Silicon Wafer Cleanroom Wipes

    ,

    Lint Free Cleanroom Wipes

  • Color
    White
  • Weight
    40g/m2
  • Size
    12'' X 12" 9'' X 9" Customized
  • Usage Industry
    Cleanroom,electronics Industry And Ect
  • Packing
    300pcs/bag
  • Logo
    Customised Logo Is Available
  • Description
    Anti-Static Cleanroom Wipes for Semiconductors Silicon Wafer

Lint Free Anti Static Cleanroom Wipes For Semiconductors Silicon Wafer

Lint Free Anti-Static Cleanroom Wipes for Semiconductors Silicon Wafer

 

Parameter Details
Material 40g Dupont Paper (Tyvek)
Size 50 x 50 cm
Packaging 250 sheets per pack, 10 packs per box
Composition High-density polyethylene, spun into filaments and heat-pressed to form a sheet
Touch and Appearance Feels more natural than film, smoother surface, folds more precisely, and is half the weight of paper
Flexibility Strong flexibility, can be folded over 20,000 times, waterproof, resistant to shedding
Chemical Resistance Resistant to most acids, alkalis, salts, and solvents
Anti-Static Treatment Surface is treated to prevent static electricity during processing
Applications Widely used in various industries, including semiconductor and LCD panel industries, for product packaging

 

 

Anti-Static Properties:

The wipe paper is treated to dissipate static electricity, reducing the risk of static discharge that can damage sensitive wafers and electronic components during processing and storage.

Chemical Resistance:

The material used in these wipes is resistant to a wide range of chemicals, allowing them to be used with various cleaning agents without degrading or releasing contaminants that could affect wafer quality.

Soft and Non-Abrasive Texture:

The wipes are made from soft, non-abrasive materials that gently clean wafers without scratching or damaging their delicate surfaces, ensuring the preservation of wafer integrity throughout the cleaning process.

 

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